How Does the SF-100 XTREME Work?
The SF-100 XTREME is an elegantly simple, easy to use micro patterning system. Through it's unique patented design, the system allows user to fabricate microdevices quickly and easily.
Smart Filter Technology provides the means for easy and efficient optical processing utilizing the SF-100. This technique utilizes reflective microoptoelectromechanical (MOEM) elements to spatially modulate light such that light can be controlled simultaneously over a field of view which provides over 750,000 individual pixels. Each SF-100 system includes a Smart Filter subassembly that incorporates all of the hardware and control software needed to produce these images in real time.
Figure 1 shows a schematic of the SF-100 XTREME. Designs are drawn using conventional engineering design or drawing programs. These designs are then transferred to SF-100 host computer for use on the system. The SF-100 computer is a standard personal computer that provides dual video output, one to the computer monitor and the other to the Smart Filter subassembly. The Smart Filter then modulates the appropriate MOEM elements which are used to produce the pattern.
Figure 1-A schematic representation of an SF-100 XTREME Maskless Lithography System
A mercury arc lamp is the source of optical energy for the SF-100. Since g-line (435 nm), h-line (405 nm), and/or i-line (365 nm) energies are transmitted to the substrate surface, many standard optical materials are compatible with the SF-100. Light energy passes from the lamp to the Smart Filter subassembly through a variety of optical components needed to provide collimated and uniform energy over the entire exposure area. The light reflects off of the Smart Filter assembly to provide the optical pattern. After passing through additional optical components, the pattern is projected onto the substrate. The SF-100 XTREME includes an automated stage assembly to provide substrate motion. This allows the substrate to be moved in three dimensions, providing alignment in two, coplanar dimensions. An inline camera is used for feature registration and inspection of the exposed substrate pattern.
A UV filter wheel is included in the light path to provide for image to substrate alignment. This sub-assembly provides for varying both the overall energy level and the individual wavelength(s) at the substrate surface. The optical components that allow for this variation can all be changed in less than 2 hours, allowing for customization of the exposure wavelength(s) and energy levels for each user.
A complete SF-100 XTREME system is shown below in Figure 2.
Figure 2-An SF-100 XTREME Maskless Lithography System
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