Results from the SF-100 XTREME
The SF-100 XTREME is an extremely flexible and reliable platform for photolithographic imaging and provides features as small as 1 micron is size. The user can choose between the standard optics, which are also available on the SF-100 ELITE and the high resolution optics, which are provided on the SF-100 XTREME only. Results from each of these are shown below.
Results from the Standard Optics
Since these are the same optics provided with the SF-100 ELITE, they provide the same results. As with the SF-100 ELITE, our website is not large enough to show all of the substrates you can pattern using these optics, but some examples of photoresist patterning on the system are shown below in Figure 1:
Figure 1-A Sampling of Substrates Patterned on the SF-100 XTREME
In addition to the above, many other materials of various shapes and sizes have been patterned using the standard optics and normal photolithographic techniques. Additionally, customers have used the standard optics for other optical processes, such as cellular manipulation, DNA/RNA fabriation, and patterning of mammal tissue.
Results from the High Resolution Optics
In order to provide the smaller pixel sizes needed for smaller features, higher resolution optics are utilized on the SF-100 XTREME. Three different pixel sizes are available, 1.25 um, 0.50 um, and 0.25 um. Standard positive photoresist processes were used in each case, with the specified reduction lens.
Figure 2-Photoresist Lines Produced with 1.25 um Pixels
Figure 3-Photoresist Lines Produced with 0.50 um Pixels
Figure 3-Photoresist Lines Produced with 0.25 um Pixels
Please contact your local sales representative for more information on these and other application areas.
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