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Yes, You Can Have it All, with The SF-100 XTREME The SF-100 XTREME is the first microlithography system that you simply modify as your needs change. Through advanced optical, mechanical, and electrical design, the system offers unprecedented flexibility, process performance, and upgradeabilty. Need to reduce your feature size? Change the optics! Need to run larger substrates? Upgrade your stage! By advancing your capabilities along a flexible, yet well defined upgrade path, your capital investment is optimized and time lost for new system qualification and process characterization is minimized. The result is that you save both time and money. When you first purchase an SF-100 XTREME system, you specify your system configuration based upon your current needs. The two major areas that you decide upon are: Even though you need to choose a configuration for your process today, this is not a final decision. Either option for the automated stage assembly and imaging optics set can be changed on a moment’s notice and are field upgrade able. Hence, your SF-100 XTREME can always be configured to support your technology requirements. Now that you have your SF-100 XTREME system running in your facility, you can always make modifications to your process, as your needs change and new challenges occur: The time for these changes ranges from a few minutes to less than 2 hours, which allows you to easily and quickly adapt to new technical requirements.
The SF-100 XTREME Includes the Following Standard Features • Multi Pixel Minimum Features: Using multiple pixels to define a feature ensures process repeatability and feature smoothness, especially for curved and angled features. • Maskless Processing: Through the elimination of photomasks, all SF-100 systems provide low operational costs, fast turnaround of new designs, and complete design versatility. • Upgrade to Automated Substrate Handling: All SF-100 XTREME systems can be interfaced with cassette to cassette or cluster tool robotics systems to provide true production level substrate processing. • Open System Architecture: We utilize an open software platform on the SF-100 XTREME systems and we offer a number of open digital and analog I/O’s as standard with each system. These can be used to interface the system with other technologies to provide turnkey and fully integrated solutions. • Intelligent Software Solutions: System performance is optimized through the use of our robust and reliable intelligent system software. Features such as skipping areas that aren’t to be exposed, auto focus, level to level alignment, and limiting operator access through administrative passwords are standard on all SF-100 systems. • No Consumable Costs for 1st Two Years of Operation: We provide all consumables for the first two years of your system operation, irrespective of usage. After this initial period, consumable costs are only for the light source, which are typically less than $1000 US each. Click here to download the SF-100 XTREME brochure. Click on the buttons below to learn more about other SF-100 maskless lithography systems. |
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