Go to IMP Home Page
See the Entire IMP Website
Contact IMP

.

Yes, You Can Have it All, with The SF-100 XTREME

The SF-100 XTREME is the first microlithography system that you simply modify as your needs change. Through advanced optical, mechanical, and electrical design, the system offers unprecedented flexibility, process performance, and upgradeabilty. Need to reduce your feature size? Change the optics! Need to run larger substrates? Upgrade your stage! By advancing your capabilities along a flexible, yet well defined upgrade path, your capital investment is optimized and time lost for new system qualification and process characterization is minimized. The result is that you save both time and money.

When you first purchase an SF-100 XTREME system, you specify your system configuration based upon your current needs. The two major areas that you decide upon are:
Automated Stage Assembly: For less critical applications, our standard ball screw stage provides high accuracy, exceptional repeatability, and robust performance. More accurate requirements need our linear drive stages, which offer sub micron repeatability, accuracy, and resolution. Since both of these solutions are provided by Aerotech, either choice provides world class precision and performance for substrate movement.
Imaging Optics Set: Previous SF-100 systems have successfully utilized our standard optics set for producing features with 15 and 5 micron pixels. For smaller features, customers utilize our high resolution optics, which can produce a variety of pixel sizes to support features as small as 1 micron in size.

Even though you need to choose a configuration for your process today, this is not a final decision. Either option for the automated stage assembly and imaging optics set can be changed on a moment’s notice and are field upgrade able. Hence, your SF-100 XTREME can always be configured to support your technology requirements.

Now that you have your SF-100 XTREME system running in your facility, you can always make modifications to your process, as your needs change and new challenges occur:
Exposure Wavelength: All standard mercury arc lamp energies are available as either broadband or monochromatic exposures. Changing these configurations takes only seconds, as numerous wavelength filters are included with each system.
Energy Level: Exchange easy access optical components to vary substrate exposure energy levels to accommodate different resist thicknesses, materials, and substrate reflectivities.
Pixel Size: Through changing reduction lens configurations, pixel sizes can be easily varied for both the standard and high resolution optics. Pixel sizes can range from 15 microns to sub-micron, as dictated by your process requirements.

The time for these changes ranges from a few minutes to less than 2 hours, which allows you to easily and quickly adapt to new technical requirements.


The SF-100 XTREME Can Be Purchased as Either a Stand Alone or Benchtop System

The SF-100 XTREME Includes the Following Standard Features

• Multi Pixel Minimum Features: Using multiple pixels to define a feature ensures process repeatability and feature smoothness, especially for curved and angled features.

• Maskless Processing: Through the elimination of photomasks, all SF-100 systems provide low operational costs, fast turnaround of new designs, and complete design versatility.

• Upgrade to Automated Substrate Handling: All SF-100 XTREME systems can be interfaced with cassette to cassette or cluster tool robotics systems to provide true production level substrate processing.

• Open System Architecture: We utilize an open software platform on the SF-100 XTREME systems and we offer a number of open digital and analog I/O’s as standard with each system. These can be used to interface the system with other technologies to provide turnkey and fully integrated solutions.

• Intelligent Software Solutions: System performance is optimized through the use of our robust and reliable intelligent system software. Features such as skipping areas that aren’t to be exposed, auto focus, level to level alignment, and limiting operator access through administrative passwords are standard on all SF-100 systems.

• No Consumable Costs for 1st Two Years of Operation: We provide all consumables for the first two years of your system operation, irrespective of usage. After this initial period, consumable costs are only for the light source, which are typically less than $1000 US each.

Click here to download the SF-100 XTREME brochure.

Click on the buttons below to learn more about other SF-100 maskless lithography systems.


________________

Click Contact Us for more information.

©2009 Intelligent Micro Patterning, LLC