How Does the SF-100 ELITE Work?
The SF-100 ELITE is an elegantly simple, easy to use micro patterning system. Through it's unique patented design, the system allows user to fabricate microdevices quickly and easily.
Smart Filter Technology provides the means for easy and efficient optical processing utilizing the SF-100. This technique utilizes reflective microoptoelectromechanical (MOEM) elements to spatially modulate light such that light can be controlled on the several micron sized regime, simultaneously over a 15mm x12mm field of view. Each SF-100 system includes a Smart Filter subassembly that incorporates all of the hardware and control software needed to produce these images in real time.
Figure 1 shows a schematic of the SF-100 ELITE. Designs are drawn using conventional engineering design or drawing programs. These designs are then transferred to SF-100 host computer for use on the system. The SF-100 computer is a standard personal computer that provides dual video output, one to the computer monitor and the other to the Smart Filter subassembly. The Smart Filter then modulates the appropriate MOEM elements which are used to produce the pattern.
Figure 1-A schematic representation of an SF-100 ELITE Maskless Lithography System
A mercury arc lamp is the source of optical energy for the SF-100. Since g-line (435 nm), h-line (405 nm), and i-line (365 nm) energies are transmitted to the substrate surface, many standard optical materials are compatible with the SF-100. Light energy passes from the lamp to the Smart Filter subassembly through a variety of optical components needed to provide collimated and uniform energy over the entire exposure area. The light reflects off of the Smart Filter assembly to provide the optical pattern. After passing through additional optical components, the pattern is projected onto the substrate. The SF-100 includes an alignment fixture for mounting of the substrate. This allows the substrate to be moved in three dimensions, providing alignment in two, coplanar dimensions and the capability to produce three dimensional structures by aligning the substrate in a third dimension perpendicular to the two coplanar dimensions. An inline camera is used for feature registration and inspection of the exposed substrate pattern.
A UV filter shutter is included in the light path to provide for image to substrate alignment. This filter is normally located in the optical path allowing for viewing of the image on the substrate. By filtering all UV energy, the substrate can be aligned to the projected image without exposing the substrate. After the substrate has been placed in the appropriate position, the filter is removed from the light path through computer controlled actuation of the filter. All of the energy from the mercury arc lamp is then projected onto the substrate, facilitating exposure of the substrate. The length of time that the filter is removed from the light path is a user provided setting in the software.
A complete SF-100 ELITE system is shown below in Figure 2.
Figure 2-An SF-100 ELITE Maskless Lithography System
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