Nanotechnology

Laser and Electron Beam (E-Beam) pixel writers have been proven to be very successful in photoresist patterning of fine features. Laser writers produce features of <1.0 mm routinely, while E-Beam lithography systems easily produce features of <0.25 mm. Although both of these systems produce exceptional line quality and small features, both types of systems have difficulty in quickly producing large features. Since both laser and E-Beam systems write features one pixel at a time, their throughput is very slow when designs are very dense or when designs contain large features.

Intelligent Micro Patterning’s SF-100 provides a cost effective solution for improving the throughput of laser and E-Beam writers. By using the laser or E-Beam writer to fabricate fine features and then using the SF-100 to pattern larger features, the user is able to drastically increase the throughput of his pixel writer without purchasing an additional pixel writer. Due to the SF-100’s cost effective design, proven high reliability, and ease of use, the pixel writer/SF-100 combination maximizes the user’s capital resources, while providing the ability to fabricate more cost effective nanotechnology devices.

The result of this mix and match partnership provides the user with:
-Efficient use of capital, by maximizing the throughput of each exposure system,
-Higher capacity from the existing pixel writer,
-Reduced operational, maintenance, and installation costs when compared to
those for an additional pixel writer, and
-Increased process capabilities by being able to process non-silicon, non-flat
substrates on the SF-100.
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